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UGC-DAE Consortium for Scientific Research



( An Autonomous Institution of University Grants Commission, New Delhi )

University Campus, Khandwa Road, Indore, M.P., India









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Hot Isostatic Press (M/S American Isostatic Press, USA), I/c: Dr. S. Chakravarty  (scha(AT)csr.res.in)
  • Capable of 30,000 psi and 2200 deg. C
  • Fully automated and has Canthal and Platinum furnaces
  • Load capacity is 3" diameter x 5" long
  • Simple and economical HIP

High Energy Ball Milling Unit SIMOLAYER (M/S Zoz, Germany), I/c: Dr. Shamima Hussain (sh(AT)csr.res.in)
  • Fully automated planetary ball mill system
  • 200-1800 rpm
  • Chamber volume of 1.5 litre
  • Cr-steel balls of 0.5 cm diameter
  • Water cooled system
  • Provision to mill under gaseous environment

IRFZ  Single Crystal Growth Furnace (M/S Crystal systems, Japan), I/c : Dr. G. M. Bhalerao (  gmbhalerao(AT)csr.res.in)
  • Single crystals of high purity can be made.
  • Has four  floating  symmetrically faced mirrors to focus the IR.
  • Ultimate pressure-5x10-5 mbar and Maximum gas pressure-9.5 atmosphere
  • Operating temperature 1800 C (Max 2100 deg. C)
  • Maximum crystal growth length  100 mm
  • Crystal growth speed - 0.05 upto 27 mm/hr

SUPRA 55 FESEM/ EDX ( M/s Carl Zeiss, Germany), I/c: Dr. Shamima Hussain (sh(AT)csr.res.in)
  • FEG with 30kV operation
  • INCA EDS analyser, BSD, Inlens, SE and STEM detector
  • 1.4 nm resolution, at 15kV
  • Magnification 12 - 9lacs
  • Peltier cooled EDS with energy resolution 129eV Resolution at MnKa

AURIGA- Cross Beam ( M/s FIB-SEM from CARL ZEISS, Germany)
  • Unique Imaging and Analysis of non-conductive specimens using all standard detectors with local charge compensation
  • Precise Processing
  • Innovative FIB technology with best-in-class resolution (< 2.5 nm)
  • High resolution live FE-SEM monitoring of the entire preparation process
  • Advanced gas processing technology for ion and e-beam assisted etching and deposition

Helios-Nano 600 i ( M/s FEI Qunta, Switzerland )
  • Dual beam SEM with EDX, EBSD and FIB technology
  • Loadlock facility for quick loading of samples
  • Omniprobe facility

LIBRA 200 TEM  ( M/s Carl Zeiss, Germany), I/c : Dr. G.M. Bhalerao (  gmbhalerao(AT)csr.res.in)
  • FEG with 120 and 200 kV operation and EDS
  • In column ? energy filter, best resolution 0.7 eV
  • TEM mode: 0.14 nm resolution, Koehler illumination, 7-hole (10-600 ?m) condenser aperture for optimum illumination, conical illumination for dark field imaging
  • STEM mode: 0.3 nm probe, pre- and post- filter HAADF
  • Port to connect ion beam-line for in-situ studies in future

GIXRD (M/S Bruker, Germany), I/c: Dr. S. Chakravarty  (scha(AT)csr.res.in)
  • XRR/HRXRD/GIXRD measurement
  • Thin film Thickness & electron density measurement
  • Lattice Mismatch between film and substrate
  • Stress/Strain Relaxation
  • Surface and interface Roughness
  • Defects and preferred orientation in thin films
  • Lateral Structure and roughness
  • Film thickness determination:  0.1 to 500 nm

Stress Strain Microprobe ( M/s.Advanced Technology Corporation, USA )
  • Ball indentation technique is applied to obtain tensile, hardness and fracture properties of materials using miniature specimens
  • Operating temperature: -160 deg. C to +700 deg. C
  • 17 kN capacity load frame
  • Spherical indenters of 0.25, 0.51, 0.76 and 1.57 mm diameter
  • Motorised X-Y table with high resolution video camera

Small Punch Creep testing System ( M/s. Toshin Kogyo, Japan)
  • Creep curve and rupture life can be obtained by testing small specimen of size 10mm x10mm x 0.5mm
  • Maximum temperature:  700 deg. C
  • Maximum load capacity: 2 kN
  • Environment: argon atmosphere
  • Load controlled and strain controlled modes of testing

X-ray Photoelectron spectroscopy (XPS) ( M/s  Specs, Germany ), I/c: Dr. Shamima Hussain (sh(AT)csr.res.in)
  • Useful for determining the oxidation states of the component elements .
  • Only pellets and thin films can be studied.
  • HPC can study in-situ reactions upto 800 deg. C

High Performance Computational systems (HP Proliant Server),
DR. N. V. Chandra Shekar ( nvcshekar(AT)csr.res.in)
  • Two nos of 4- socket multicore Intel Xeon server E7-4870  ( HP Proliant DL580 Gen 7 model ) with 6.4 GT/s Intel QPI bus speed
  • Two nos of 2 x Inel Xeon 5687 , 4 core  ( HP Z800 workstation ) with 6.4 GT/s Intel QPI bus speed
  • HP LTO-5 backup device
  • Ten nos of client workstations ( HP Compaq 8200 elite model )

Materials Studio code ( M/s Accelrys, Bangaluru ), DR. N. V. Chandra Shekar ( nvcshekar(AT)csr.res.in)
  • Computer simulation code "materials studio", which is very useful for many ab-initio calculations in physical, engineering and chemical sciences has been installed.
  • Materials Studio provides a complete range of simulation capabilities from quantum, atomistic, mesoscale, statistical, analytical and crystallization tools.

Sample Preparation Facilties for Electron Microscopy, I/c: Dr. Shamima Hussain (sh(AT)csr.res.in)
Vacuum Impregnation Unit CITOVAC ( M/s  STRUERS, DENMARK)
  • Handy inlet tube for trouble-free filling of the mounting cups, and no spilling
  • Easy-to-read display and touch pad keys for user-friendly operation

  • Low mass mounting units for fast heating
  • Automatic detection of cylinder dimension
  • Automatic dosing system for faster filling of the cylinders and less spilling of resins
  • Ultra-short mounting times and maximum user friendliness.

Grinding/Polishing Unit LABOPOL (M/s STRUERS, DENMARK)
  • Machines for grinding, lapping and polishing
  • User-friendly and easy operation
  • Quick exchange of grinding, lapping and polishing discs
  • Table-top design in corrosionresistant material
  • Automation with the specimen movers

e-Beam evaporation system, I/c: Dr. Shamima Hussain (sh(AT)csr.res.in)
  • 3kW e-Gun
  • Rotating substrate holder
  • Substrate temperature can go upto 300 deg. C
  • Has a four carousel system
DC/RF Magnetron sputtering system, I/c: Dr. S. Chakravarty  (scha(AT)csr.res.in)
  • 2” magnetron cathode- 3 nos
  • 2 rf source with 600 Watt/ 13.56 MHz rf power supply
  • 1 dc source with 1000 Watt power supply
  • 3MFC for Ar, N2 and O2
  • Both, co-sputtering and reactive sputtering possible
  • Substrate rotation
  • Substrate heating during deposition upto 800C
  • Adjustable substrate to target distance
  • Base vacuum better than 5 e-7mbar

15T Magneto-resistance System (From M/S Cryogenics, UK), I/c: Dr. S. Chakravarty  (scha(AT)csr.res.in)


15T superconducting magnet (cryo-free with the help of a Pulse Tube Refrigeration (PTR) and close cycle He circulation.

  1. Samples orientation with respect to the applied field : in-plane and out-of-plane.
  2.  Resistivity measurement with Keithley 2182 nanovoltmeter and Keithley 2400 source meter.
  3. Hall Measurement (7065) in linear and Van-der Pauw geometry with Keithley 7001 switch.
  4. Multisample measurement upto 3 samples (In-plane only)


SQUID VSM Magnetic Property Measurement System (MPMS), I/c: Dr. S. Chakravarty  (scha(AT)csr.res.in)
  1. Magnetic field 7T (cryo-free magnet)
  2. SQUID VSM with AC Susceptibility option
  3. Temperature range 2-300K
Micro Raman system (with temperature variation) (InVia from M/S Renishaw, UK), I/c: Dr. Shamima Hussain (sh(AT)csr.res.in)

1. Two excitation lasers:

                   514 nm (Ar ion)
                   785 nm (diode)

2. Mapping functions enabled:

                   surface (x,y)
                   confocal (z)

3. Samples temperature control:

                   77 K to 873 K

Nuclear Magnetic Resonance (NMR) System (M/S Bruker), I/c: Dr. S. Chakravarty  (scha(AT)csr.res.in)

  1. 400MHz NMR spectrometer
  2. High resolution 9.4 T magnet
  3. Frequency ranges: 13C, 15N to 31P, 19F and 1H NMR capabilities.

Probes: Liquid and Solid state magic angle spinning probe


200kV Ion Accelerator, M/s High Voltage Engg, The Netherlands, I/c : Dr. G.M. Bhalerao (  gmbhalerao(AT)csr.res.in)


Energy :Upto 200 kV Max.; Ions: H to Au














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