Dr. Mukul Gupta
Scientist-G
Indore Centre

About

Education
Degree Institution Specialisation Year
B.Sc. CCSU, Meerut Physics, Chemistry, Mathematics 1995
M.Sc. University of Roorkee (IIT Roorkee) Engineering Physics 1997
Ph.D. DAVV (UGC-DAE CSR), Indore PREPARATION AND CHARACTERISATION OF MULTILAYERS WITH 56Fe/57Fe SUPERSTRUCTURE FOR APPLICATION AS NUC 2002
Experience
Position Institution Year
Scientist UGC-DAE CSR, Indore 2005-present
Post Doctoral Fellow Paul Scherrer Institute, Switzerland 2002-2005

Facilities

# Facility Specification Best suit for
1 Soft x-ray absorption at Indus-2 (MG) Energy = 100 to 1200 eV; Beamsize at sample ~ 0.5 mm; Sample environment: UHV chamber with 100 mm linear motion, 50 mm linear + rotary motion, in-situ XAS, XMCD with 1 T electromagnet, 10 K CCR (soon) 12mmx8mmx1mm (for XAS); 5mmx5mmx1mm (for XMCD); Solid samples only - compatible to UHV conditions
2 Ion Beam Sputtering (MG) rf ion source, energy 0.25 to 1.2 keV, typical beam current 40 mA Target size 100mmx100mmx1mm; up to 4 different targets
3 2-inch Target Magnetron Sputtering (MG) UHV compatible chamber| 3x two inch magnetron sources | 1x one inch magnetron source | dc/rf power supplies Target size 2 inch diameter or 1 inch diameter
4 3-inch Target High Power Impulse Magnetron Sputtering (MG) 4×3-inch magnetrons; 3×dc power supplies;1×HiPIMS power supply; substrate temperature: 80K or 300 - 1000 K; load-lock; in-situ RHEED; in-situ RGA; base pressure 5x10-8 Torr; rf-substrate bias; substrate rotation; single layer, multilayer or co-sputtering options; substrate height adjustment; possibility to mix 3 gases deposition of samples on flat substrates; maximum thickness 100 nm
5 UHV-Rapid Thermal Annealing (MG) Ramp rate 100 K/s, Base pressure 1x10-9 mbar (process chamber), 5x10-8 mbar (load lock chamber), load lock with pre-heating (to remove moisture), maximum temperature 1273 K, thermocouple and pyrometer for temperature measurement and control, fully automated computer controlled system for state of art rapid thermal processing/annealing. 15mmx15mm or 10mmx10mm or 10mmx5 mm or 5mmx5mm
6 High Vacuum Thermal Annealing (MG) Base pressure < 5E-7 mbar | 50mm x 50mm Pyrolytic Boron Nitride (PBN) heater | Temp. 50 to 500 C | K-type thermocouple Up to 40 mm x 40 mm
7 Secondary Ion Mass Spectroscopy (MG) Gas gun E = 5 keV, I = 100 - 400 nA; base pressure 2x10-10 mbar 10mmx10mmx1mm; up to 9 samples can be loaded at a time
8 D8 Advance - Powder XRD (MG) Powder XRD system with 1D PSD (Bruket LynxEye) up to 25 mm dia; max thickness 3 mm
9 Ultrasonic sample cleaner (MG)

Group

Research highlights

Publication

Awards/Achievements

Vacancy

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